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用于制备表面为特定晶面的单晶空间取向调控方法和装置
Note:
发明人：陈艳霞：郑勇力；魏杰；廖铃文；
Type of Patent:
Invent
State of Patent:
Authorized patents
Authorization number:
CN201510364164.7
Number of Inventors:
4
Service Invention or Not:
no
Authorization Date:
2017-10-03
Next One:
一种适用于电化学原位拉曼光谱检测的薄层流动电解池
